| 摘要 |
Crom mask manufacturing method comprises the steps of forming a crom film for masking on the upper part of a quartz substrate, coating a photoresist on the upper part of the crom film, forming a original crom mask pattern which a predetermined pattern is already formed on the upper part of the photoresist at the distance minimizing light scattering, forming a photoresist pattern by light exposing and developing the photoresist by using the original crom mask pattern as a mask, and forming a crom film pattern for a mask by etching the crom film by using the photoresist pattern as a mask. Thereby, the price for manufacturing the crom mask is reduced.
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