发明名称 |
Exposure apparatus for transferring a mask pattern onto a substrate |
摘要 |
An exposure method for irradiating a mask from above the mask held in proximity to a substrate positioned below the mask to transfer a mask pattern of the mask to a photosensitive layer of the substrate by exposing the photosensitive layer to a light beam, includes the steps of using a gap-measuring device to measure a gap between a portion of the mask to be locally scanned and irradiated and a portion of the substrate to be locally irradiated, comparing a value measured by the gap-measuring device with a preset value, and locally deforming the mask and/or the substrate according to a difference between the value measured by the gap-measuring device and the preset value so as to cause the gap to approach a predetermined value.
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申请公布号 |
US5737064(A) |
申请公布日期 |
1998.04.07 |
申请号 |
US19960699787 |
申请日期 |
1996.08.20 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
INOUE, TAKASHI;NAGANO, HIROYUKI;ISHII, YOSHIMICHI |
分类号 |
G03F7/20;G03F9/02;(IPC1-7):G03B27/60 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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