| 摘要 |
<p>An exposure apparatus includes a light source (34), an illumination optical system (36,37) for forming a secondary light source with light from the light source, and for illuminating a portion of a reticle having a pattern, a projection optical system (2) for projecting the pattern of the reticle as illuminated, on to a wafer, a reticle stage (1) for supporting the reticle and for scanningly moving the reticle in a predetermined scan direction, relatively to the projection optical system, a wafer stage (3) supporting the wafer and for scanningly moving the wafer relatively to the projection optical system, and a base (9) for supporting the reticle stage and being supported by dampers (11), wherein the illumination optical system is divided into a first portion (31) being supported by the base (9) and a second portion (32) supported by a floor, independently from the base, and wherein the predetermined direction of the reticle stage is substantially or approximately parallel to an optical axis direction at a location where the illumination optical system is divided. <IMAGE></p> |
