LASER INTERFEROMETRIC LITHOGRAPHIC SYSTEM PROVIDING AUTOMATIC CHANGE OF FRINGE SPACING

摘要

An interferometric lithographic apparatus (10) includes an arrangement for applying interfering laser beams (11) to a part for producing a first interference pattern. The first interference pattern has a first fringe spacing. A mobile part holder stage (32, 44) is repositioned to change the interference pattern and produce a second fringe spacing (N).