FLUORINE ASSISTED STRIPPING AND RESIDUE REMOVAL IN SAPPHIRE DOWNSTREAM PLASMA ASHER

摘要

A method for removing material from a substrate. A plasma is generated in a plasma generating and discharge device including a sapphire plasma tube (40). At least one fluorine-containing compound is introduced into the plasma. A forming gas is introduced into the plasma. The plasma is directed toward the material to be removed from the substrate (88).