发明名称 Energieversorgungskontakt für integrierte Schaltungen
摘要 An integrated circuit formed on a substrate (101) has field effect transistors formed in relatively lightly doped (i.e., high resistivity) epitaxial layer (113), typically in a "tub" (102,103) formed therein. Operating current for the transistors is provided at least in part through a metallic layer (100) on the back side of the substrate. Surprisingly, the conductivity is sufficiently high through the epitaxial layer and the substrate that the number of power supply bondpads on the front side may be reduced, or eliminated entirely in some cases. In addition, a reduction in power supply lead inductance is obtained, reducing ringing and ground bounce problems.
申请公布号 DE68928483(T2) 申请公布日期 1998.04.02
申请号 DE1989628483T 申请日期 1989.09.12
申请人 AT & T CORP., NEW YORK, N.Y., US 发明人 GABARA, THADDEUS J., SCHNECKSVILLE PENNSYLVANIA 18078, US
分类号 H01L21/3205;H01L21/822;H01L21/8238;H01L23/482;H01L23/52;H01L23/528;H01L27/04;H01L27/092;(IPC1-7):H01L23/50;H01L23/48 主分类号 H01L21/3205
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