Exposure projector for integrated circuit production

摘要

The projection system is located between the optical plate (R) and substrate (W), projects a beam, and has a numerical aperture of at least 0.55 for the plate pattern projecting onto the substrate, while meeting specified conditions, related to changes of spherical aberration of max. aperture at max. image height when the ambient pressure has changed by 30 mm Hg. Another condition is related to the change of coma of max. numerical aperture at max. image height when the ambient pressure of the projection system has been changed by 30 mm Hg. Pref. the projection system contains a lens group with positive refraction, another lens group with negative refraction, one more positive and negative refraction lens group, and a fifty positive refraction lens group.