发明名称 Integrierte Halbleiterspeicheranordnung
摘要 An integrated semi-conducting storage assembly presenting a semi-conducting body with integrated selection transistors (10) and storage capacitors (20). Storage capacitors (20) are provided with a dielectic layer (23) which is placed between two electrodes (21,23). At least the upper electrode (23) is designed in the form of layers with a platinum layer (23a) associated to the dielectric layer (22) and a thicker, base metal layer (23b) on top.
申请公布号 DE19640218(A1) 申请公布日期 1998.04.02
申请号 DE19961040218 申请日期 1996.09.30
申请人 SIEMENS AG, 80333 MUENCHEN, DE 发明人 SCHINDLER, GUENTHER, DR., 80802 MUENCHEN, DE;HARTNER, WALTER, DIPL.-PHYS. (UNIV.), 89441 MEDLINGEN, DE;HINTERMAIER, FRANK, DR., 81373 MUENCHEN, DE;MAZURE, CARLOS, DR., 85614 KIRCHSEEON, DE;BRUCHHAUS, RAINER, DR., 80997 MUENCHEN, DE;HOENLEIN, WOLFGANG, DR., 82008 UNTERHACHING, DE;ENGELHARDT, MANFRED, DR., 83620 FELDKIRCHEN-WESTERHAM, DE
分类号 H01L27/10;H01L21/822;H01L21/8242;H01L21/8246;H01L27/04;H01L27/105;H01L27/108;H01L27/115;(IPC1-7):H01L27/108;H01G7/06 主分类号 H01L27/10
代理机构 代理人
主权项
地址