| 摘要 |
In the method of exposing a relatively large number of parallel, spaced apart stripe-like areas on the surface of a photo-sensitive member by directing light against such surface through an original photo-mask having a light-permeable pattern comprised of a relatively small number of parallel, spaced apart transparent stripes of lengths substantially smaller than the length of the areas to be exposed, and by effecting repeated relative scanning movements of the photo-sensitive member and photo-mask in the direction of the transparent stripes and relatively shifting the photo-sensitive member and the photo-mask in the direction transverse to the transparent stripes for each of the relative scanning movements so that, upon the completion of the repeated movements, light passing through the light-permeable pattern of the photo-mask will have scanned the desired relatively large number of stripe-like areas to be exposed on the surface of the photo-sensitive member; the transparent stripes of the original photo-mask are formed with respective lengths that decrease progressively from maximum values adjacent the center of the light-permeable pattern, considered in the direction of the relative shifting, to minimum values at the opposite sides of the pattern also considered in the direction of the relative shifting, and each relative shifting is effected through a predetermined distance equal to (1/2n)W, in which n is an integer and W is the effective width of the light-permeable pattern in the direction of the relative shifting, whereby to minimize variations in the pitch between adjacent exposed stripe-like areas on the photo-sensitive member due to unavoidable variations in the relative shifting of the photo-sensitive member and the original photo-mask.
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