发明名称 |
Improvements in or relating to the cleaning of semiconductor devices |
摘要 |
An embodiment of the instant invention is a method of removing inorganic contamination (contamination 104 of FIGUREs 2a-2b) from a layer (layer 102) overlying a substrate (substrate 100), the method comprising the steps of: removing the layer overlying the substrate with at least one removal agent; reacting the inorganic contamination with at least one conversion agent, thereby converting the inorganic contamination; removing the converted inorganic contamination by subjecting it to at least one solvent agent, the solvent agent included in a first supercritical fluid; and wherein the converted inorganic contamination is more highly soluble in the solvent agent than the inorganic contamination. <IMAGE> <IMAGE> <IMAGE> <IMAGE> |
申请公布号 |
EP0822583(A3) |
申请公布日期 |
1998.04.01 |
申请号 |
EP19970305822 |
申请日期 |
1997.08.01 |
申请人 |
TEXAS INSTRUMENTS INCORPORATED |
发明人 |
DOUGLAS, MONTE A.;TEMPLETON, ALLEN C. |
分类号 |
B08B3/08;B08B7/00;C11D7/50;C11D11/00;H01L21/304;H01L21/306 |
主分类号 |
B08B3/08 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|