发明名称 |
Resin etching solution and etching process |
摘要 |
A resin etching solution comprises a hydroxyalkylamine, an alkali metal compound and water, or an aliphatic alcohol, an aliphatic amine, an alkali metal compound and water, and a process for etching a polyimide film comprises forming a resist pattern or metal layer pattern using the resin etching solution. |
申请公布号 |
EP0832918(A1) |
申请公布日期 |
1998.04.01 |
申请号 |
EP19970307359 |
申请日期 |
1997.09.22 |
申请人 |
TORAY ENGINEERING CO., LTD. |
发明人 |
SUZUKI, ATSUSHI;AIMOTO, MAYUMI;KUBOTA, TAKASHI;AKITA, MASANORI;ITOH, KOJI |
分类号 |
C08J7/12;C09K13/02;H05K1/03;H05K3/00 |
主分类号 |
C08J7/12 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|