METHOD FOR MEASURING PHASE DIFFERENCE OF SHIFTER OF PHASE SHIFT MASK, AND MASK USING THE SAME

摘要

PROBLEM TO BE SOLVED: To obtain an easy, exact and highly cost-effective method for measuring the phase difference of a phase shift material. SOLUTION: A mask having a first pattern consisting of an opaque material and a second pattern consisting of the phase shift material is formed on a light transparent substrate. A photosensitive material is exposed through the mask and is developed. The best focal position of the opaque material mask of the first pattern formed in accordance with the first pattern by utilizing image shortening and the best focal position of the phase shift material mask of the second pattern formed in accordance with the second pattern are determined. The best focal position 20 of the opaque material mask and the best focal position 30 of the phase shift material mask are compared. The shift 50 of the best focal position of the phase shift material mask is determined from the best focal position of the opaque material mask and the phase difference quantity of the phase shift material is measured in accordance therewith.