发明名称 DEVICE FOR GENERATING WIDE-SCALE PLASMA WITH HIGH DENSITY
摘要 PURPOSE: A device is provided to generate a wide-scale plasma having regular density, under the low injection gas pressure. CONSTITUTION: A device(100) for generating a wide-scale plasma with high density comprises a main chamber(102) and a plurality of plasma sources(104). A wide-scale plasma is formed on the main chamber. The plurality of plasma sources with high density are formed on a side wall of the main chamber. The device further comprises an inductive antenna(106). The inductive antenna formed on an upper side of the device is generated from the many plasma sources, and uniforms density of the plasma supplied from the main chamber regardless of positions of the main chamber. The plasma sources include axis-directional magnetic fields with axis directions, obtaining high plasma density and high plasma generating efficiency. The device is equipped with a high frequency inductive antenna under the axis-directional magnetic fields, formed by an outer electromagnet, and applies gas supplied from a gas injector as a plasma.
申请公布号 KR20000023885(A) 申请公布日期 2000.05.06
申请号 KR19990021360 申请日期 1999.06.09
申请人 MEXTECH SOLUTION CO., LTD. 发明人 HWANG, YONG SEOK;CHOI, WON HO
分类号 H05H1/24;(IPC1-7):H05H1/24 主分类号 H05H1/24
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