METHOD FOR DESIGNING MANUFACTURING PROCESS FOR DEVICE TO BE MANUFACTURED, AND COMPUTER SYSTEM FOR DESIGNING SEMICONDUCTOR MANUFACTURING PROCESS FOR SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To reduce the cost and the cycle time of the design of a manufacturingrocess flow, by dividing the work for designing the process flow into many abstracting levels, and providing the structure for performing the transfer between the abstracting levels. SOLUTION: The work of a microelectronic manufacturing process is divided into a plurality of reusable process modules. Then, the design requirements are transferred between these process module levels. Thenz by intersecting the designation of the final wafer state with accepting model of the specified module under the final wafer state, the restriction on the final wafer state is propagated to the rear side (left side) through the final module (module M2) in the flow. That is to say, a region for describing the restriction for the wafer state (wafer state X) before processing the final module is formed.