| 摘要 |
<p>Tetrafluoroethylene oxidation process at temperatures comprised between -100 DEG C and -40 DEG C, in absence of UV radiations, and by operating in the presence of a chemical initiator containing at least one F-X bond, wherein X is oxygen or halogen, in the presence of a solvent comprising an amount of COF2 higher than 8% by moles.</p> |
