METHOD OF FEEDING GAS INTO A CHAMBER

摘要

The present invention provides a method for alternately feeding reactive gas and inert gas into a chamber, and is preferably used in a semiconductor manufacturing plant to form films on wafers. The inert and reactive gas feed lines have shunt valves connected as branches to the primary sides of the line changeover valves, with a vent line being connected to the outlet sides of the shunt valves. The opening and closing operation of the line changeover valves and the shunt valves alternately feeds reactive gas and inert gas into the chamber, the lines being changed over after a specified time interval. The simultaneous evacuation and exhaustion of the vent line by a vacuum pump suppresses pressure fluctuations in the chamber during changeover of the gas feed lines.