| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device, which augments the intensity of SR light, which is radiated on a required exposure surface, and is made the throughput enhance, by a method wherein the SR light is condensed at a large launch angle in the horizontal direction of synchroton radiation (SR light), which is sheetlike electromagnetic waves, and a method of manufacturing a device using this exposure device. SOLUTION: This exposure device is provided with at least one group of plane mirrors 13 and 14, which oppose to each other holding main light beams between them on the surface of an SR orbit and are respectively arranged on two steps in the direction of the main light rays, and more than one sheet of irradiation mirrors 15, which receive SR light 12 reflected from the plane mirrors to reflect the SR light and radiate the SR light on a mask 18. In this case, the first-step plane mirror 13 of the plane mirrors arranged on the two steps receives the SR light 12 and makes the received SR light 12 reflect on the second-step plane mirror 14, which is located on one side of the opposed positions holding the main light rays between them, the optical path of the SR light, which is reflected from the second-step plane mirror 14, is modified so that the effective region of a mask can be irradiated with the SR light and the direction of each plane mirror and the direction of the SR light, which is incided in each plane mirror, are set in the prescribed relation between each plane mirror and the SR light so as to prevent a plane, on which the SR light is formed, from being rotated. |
