| 摘要 |
PURPOSE: Chemical deposition apparatus and method are provided to reduce waste of raw materials and increase use efficiencies of raw materials by supplying the raw material to other reactor while a raw material is not being supplied to one reactor in a chemical deposition apparatus having many reactors. CONSTITUTION: A chemical deposition apparatus is equipped with two or more reactors in which a chemical deposition reaction is carried out, two or more tanks for storing raw materials for the chemical deposition reaction, supplying pipes for supplying raw materials from the storage tanks to the reactors, a controller commonly controlling flow rates of raw materials which are supplied through the supplying pipes supplying the same raw materials among the supplying pipes, and a valve opening or closing flow of raw materials which are supplied through the supplying pipes. In a chemical deposition method in which the chemical deposition process is proceeded by sequentially supplying two or more raw materials to reactors of a chemical deposition apparatus equipped with two or more reactors, a raw material supply frequency is set so that one of the raw materials is not bypassed or discharged but supplied to one of the reactors at least for a part of time gap when one of the raw materials is not supplied to one of the reactors.
|
