发明名称 |
Beam exposure system having improved mask unit |
摘要 |
In a beam exposure system, a beam is irradiated onto a mask unit, and the beam passed through the mask unit is deflected and is irradiated onto a target. The mask unit includes a polygonal hollowed holder and a plurality of masks. The holder is formed by mask mounting plates each having apertures for mounting the masks, and frames each having an aperture for passing the beam therethough.
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申请公布号 |
US5731591(A) |
申请公布日期 |
1998.03.24 |
申请号 |
US19970784513 |
申请日期 |
1997.01.17 |
申请人 |
NEC CORPORATION |
发明人 |
YAMADA, YASUHISA;NOZUE, HIROSI |
分类号 |
G03F7/20;H01J37/317;H01L21/027;(IPC1-7):H01J37/302 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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