Method for conditioning halogenated polymeric materials and structures fabricated therewith
摘要
A halogenated polymeric material is exposed to a reducing agent and/or an electrolyte and applied voltage to render exposed portions capable of being metallized and of being etched. The exposed portions can also be doped to thereby induce electrical conductivity therein. Also, new structures containing a free standing halogenated polymeric-containing layer and electrical conductive pattern thereon are provided.
申请公布号
US5730890(A)
申请公布日期
1998.03.24
申请号
US19960715376
申请日期
1996.09.12
申请人
INTERNATIONL BUSINESS MACHINES CORPORATION
发明人
BICKFORD, HARRY RANDALL;FOSTER, ELIZABETH;GOLDBERG, MARTIN;MARKOVICH, VOYA RISTA;MATTHEW, LINDA;TISDALE, STEPHEN LEO;VIEHBECK, ALFRED