IRRADIATION SOURCE FOR FLAT PROJECTOR

摘要

PROBLEM TO BE SOLVED: To provide an improved plasma source emitting a EUV radiation usable as an irradiation source for a flat projector. SOLUTION: The irradiation source 220 in an irradiation system for the flat projector comprises electrodes 221, 222 for generating discharge therebetween so that the discharge may collapse in a pinch capacity 229. The collapsing discharge induces high-temperature plasma intensely ionized in the pinch capacity. As working fluid in a supply source 227 is discharged from a jet nozzle into the pinch capacity, the temperature rises into a high temperature condition for emitting a far infrared beam PB.