| 摘要 |
An illumination apparatus has at least one of a luminous flux angle adjustment means and a luminous flux translation means. Due to these luminous flux angle adjustment means and luminous flux translation means, the inclination and positional deviation of a luminous flux can be corrected with a high accuracy without finely adjusting the position of the light source. Accordingly, when this illumination apparatus is incorporated in a projection exposure apparatus, change in exposure light quantity and fluctuation in illuminance can be suppressed so as to stably effect exposure.
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