发明名称 |
Semiconductor wafer cleaning apparatus |
摘要 |
A semiconductor wafer cleaning apparatus having an edge rinse member adapted for rinsing edges of a semiconductor wafer and having a moving member adapted to permit horizontally movement of the edge rinse member, wherein the apparatus is adapted to minimize or prevent an upper surface of the wafer from being stained with pollutants during rinsing. The wafer cleaning apparatus minimizes or prevents rebounding of a rinse solution containing particles from the inside wall of a bowl during rinsing of the edges of a semiconductor wafer.
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申请公布号 |
US5729856(A) |
申请公布日期 |
1998.03.24 |
申请号 |
US19960773339 |
申请日期 |
1996.12.26 |
申请人 |
SAMSUNG ELECTRONICS CO. LTD. |
发明人 |
JANG, DONG-HEUI;KIM, DONG-HYUN;KIM, CHOUNG-HEE;JANG, SE-YEON |
分类号 |
H01L21/027;A46B9/02;H01L21/304;(IPC1-7):A46B11/06 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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