| 摘要 |
PURPOSE: To improve the resolution of a projecting optical system to a prescribed pattern shape, while satisfactorily suppressing light quantity loss and securing a prescribed focus depth. CONSTITUTION: This device is provided with angle luminous flux forming means (4 and 5), for converting luminous fluxes from a light source means (1) into the luminous fluxes provided with various angle components to a reference optical axis (AX) and making them be incident on a first prescribed surface, irradiation field formation means (6 and 7) for forming tow irradiation fields which is eccentric almost symmetrical with respect to the reference optical axis on a second prescribed surface, based on the incident luminous fluxes provided with the various angle components, an optical integrator (8) for forming a bipolar secondary light source provided with the almost same light intensity distribution, based on the luminous fluxes from the formed two irradiation fields and a light guide optical system (10), for guiding the luminous fluxes from the optical integrator to a surface (M) to be irradiated. |
