| 摘要 |
PROBLEM TO BE SOLVED: To obtain an apparatus for manufacturing semiconductors, enabling two wafers to be processed together and simultaneously, wherein the time taken to transfer waters in the atmosphere has no effect on the throughput, and also to provide an apparatus for easily manufacturing semiconductors ready for AGV etc., which is adaptable to the control of water such as one cassette / one lot control, two cassettes / one lot control, etc. SOLUTION: An apparatus for processing semiconductors, wherein two semiconductor wafers are processed simultaneously under a reduced pressure is provided with two carrier robots 14, 15 for carrying semiconductor wafers, a buffer stage 19 enabling two or more semiconductor wafers for loading and two or more semiconductor wafers for unloading to be contained simultaneously, and cassette stages 20 to 23 for cassettes containing two or more semiconductor wafers, all provided in the atmosphere, and furthermore, is provided with a vacuum preprocessing chamber 13, 17 and a pressure-processing chamber 12. |
