发明名称 Method for the determination of nitrogen concentration in compound semiconductor
摘要 An efficient method is proposed for the determination of the concentration of nitrogen in an indirect-transition compound semiconductor such as gallium phosphide added as an isoelectronic trap. The method utilizes the fact that a good correlation of proportionality is held between the nitrogen concentration and the difference DELTA alpha (= alpha N- alpha ) in the absorption coefficient of light of a wavelength identical with the wavelength lambda N due to the excitons under constraint in the isoelectronic trap between the semiconductors with ( alpha N) and without ( alpha ) addition of nitrogen. A working curve is presented between the nitrogen concentration determined by the method of SIMS and the value of DELTA alpha .
申请公布号 US5731209(A) 申请公布日期 1998.03.24
申请号 US19960614206 申请日期 1996.03.12
申请人 SHIN-ETSU HANDOTAI CO., LTD. 发明人 YAMADA, MASATO;YANAGISAWA, MUNEHISA;HIGUCHI, SUSUMU
分类号 G01N21/31;H01L21/66;H01L33/30;(IPC1-7):G01N21/59 主分类号 G01N21/31
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