发明名称 EXPOSING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a satisfactory projected image over the whole exposing area of a photosensitive base by controlling the displacement and rotating slippage laid along the scanning direction of the base, and controlling the displacement laid along the scanning orthogonal direction of the base. SOLUTION: A lighting optical system lights the pattern area 101a of a mask 101 supported in parallel to xy plane. The light passed through the pattern area 101a of the mask 101 forms an equally magnified erect image of the mask pattern in the exposing area 102a of a plate 102 through a projecting optical system 1. A scanning exposure is performed while the mask 101 and the plate 102 are integrally moved to the projecting optical system 1 along x-direction (scanning direction). In this device, the displacement laid along the scanning direction (x-direction) between the mask 101 and the plate 102 and the rotating slippage to the optical axis of the projecting optical system 1 can be controlled by a driving mechanism. Further, the displacement laid along the scanning orthogonal direction (y-direction) between the mask 101 and the plate 102 can be also controlled.
申请公布号 JPH1073932(A) 申请公布日期 1998.03.17
申请号 JP19970126308 申请日期 1997.04.30
申请人 NIKON CORP 发明人 KATO KINYA;SHIRASU HIROSHI;KAKIZAKI YUKIO
分类号 G03F9/00;G03F7/20;H01L21/027;(IPC1-7):G03F9/00 主分类号 G03F9/00
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