发明名称 Apparatus for coating substrates by cathode sputtering with a hollow target
摘要 A pot-shaped hollow target (4) is open toward the substrate (3) that is to be coated, a dark-space shield (6) surrounds the lateral wall (5) of the target (4), and a cathode base body (11) is supported on an insulator (8) on the roof (9) of the vacuum chamber (2) and is connected electrically to a power source (10). A magnet belt (12) formed of a plurality of magnets (18, 18') surrounds the dark-space shield (6). A turntable (15) having an axis of rotation (16) parallel to and offset from the target's (4) perpendicular plane of symmetry (17) is provided for holding the substrates (3).
申请公布号 US5728280(A) 申请公布日期 1998.03.17
申请号 US19970802226 申请日期 1997.02.19
申请人 BALZERS PROZESS SYSTEME GMBH 发明人 SCHERER, MICHAEL
分类号 C23C14/34;C23C14/04;H01J37/34;(IPC1-7):C23C14/34 主分类号 C23C14/34
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