| 摘要 |
PROBLEM TO BE SOLVED: To realize light-exposure with high resolution and margins by a method wherein a substrate stage holding substrate is driven in an optical axis direction and in a flapping direction, so that focusing means for positioning the substrates on an image face of a projection optical system is provided. SOLUTION: A reticle stage 1 and a Y stage 3b are moved at a specific speed ratio in a Y direction, and patterns on the reticle are scanned by slit-like exposed lights, and also waferns are scanned by the projection image to transfer the patterns to a transfer region on the wafers. During the scanning light- exposure, a height of a wafer face is measured by a focus sensor 13, and the height and tilt of the wafer stage 3 are controlled at a real time based on the measurement value to correct focus. After the scanning light-exposure for one transfer region is finished, an X stage 3a and/or a Y stage 3b are driven to move the wafer to the X direction and/or Y direction, and the other transfer regions are positioned for a start position of the scanning light-exposure, and the next scanning light-exposure is carried out. Thereby, a focus error traceable to distortions of a negative stage face is reduced. |
