发明名称 |
Method of preparing compound semiconductor crystal |
摘要 |
A compound semiconductor crystal has a reduced dislocation density. The compound semiconductor crystal doped with an impurity satisfies the following relations, wherein c.c. represents its carrier concentration and eta represents its activation factor: eta </=c.c./(7.8x1015) (1) eta </=(10/19)x(197-2.54x10-17xc.c.) (2) eta >/=c.c./(3.6x1016) (3) A method which can prepare a compound semiconductor crystal doped with an impurity and having a prescribed carrier concentration with excellent reproducibility comprises the steps of melting a raw material for the compound semiconductor crystal in a crucible, and controlledly cooling the obtained raw material melt, thereby growing a crystal. The time required for cooling the raw material melt from the melting point T of the raw material to +E,fra 2/3+EE T is so controlled as to adjust the carrier concentration to a prescribed level.
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申请公布号 |
US5728212(A) |
申请公布日期 |
1998.03.17 |
申请号 |
US19960710580 |
申请日期 |
1996.09.19 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
INOUE, TETSUYA;HAGI, YOSHIAKI |
分类号 |
C30B15/02;(IPC1-7):C30B15/02 |
主分类号 |
C30B15/02 |
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