发明名称 PATTERN DEFECT DETECTING DEVICE
摘要 PROBLEM TO BE SOLVED: To quickly detect defects in a pattern with a constitution of small capacity. SOLUTION: A master pattern setting processing for setting up the position of a master pattern against a camera is executed (100), and master data are prepared based on the vertical/horizontal run length codes of the master pattern (102). Then, prepared pattern setting processing for setting up the position of the prepared pattern to be compared against the camera is executed (104), the vertical/horizontal run length codes of the prepared pattern are generated for each pixel and the generated data are compared with the master data to detect defects in the prepared pattern (106). The processing is executed for all prepared patterns until the detect detection is completed (108).
申请公布号 JPH1074261(A) 申请公布日期 1998.03.17
申请号 JP19960231076 申请日期 1996.08.30
申请人 KOKUSAI GIJUTSU KAIHATSU KK 发明人 KAWAMORI MAKOTO
分类号 G01B11/24;G01N21/88;G01N21/93;G01N21/956;G03F1/84;G06T7/00;G06T7/60;H01L21/027;H01L21/66 主分类号 G01B11/24
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