发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To easily form ohmic contacts at the collector and the emitter of a semiconductor device by forming a first ohmic contact for obtaining contact on a first terminal and a second ohmic contact for obtaining contact on a first quantum well layer. SOLUTION: An ohmic contact (collector contact) of a collector of a semiconductor device is provided for a collector 5, after patterning and diffusing through a plurality of semiconductor layers 11. The collector contact has no problem because the contact cannot be ohm-contacted to the layers 11. In addition, the layers 11 are not doped, and a quantum well formed in a second active layer 25 contains no carrier. The ohmic contact 63 of the emitter of the semiconductor device is provided for the emitter 41 at a distance from a confining area 51 at which the patterned emitter 41 and the patterned collector 5 intersect each other. The ohmic contact 63 of the emitter 41 also does not form any ohmic contact with the semiconductor layers 11.
申请公布号 JPH1074932(A) 申请公布日期 1998.03.17
申请号 JP19970218601 申请日期 1997.08.13
申请人 TOSHIBA CORP 发明人 LEADBEATER MARK LEVENCE;PATEL NALIN KUMAR
分类号 H01L29/06;H01L21/334;H01L29/66;H01L29/68;H01L29/772;H01L33/06;H01S5/062;H01S5/30;H01S5/34;(IPC1-7):H01L29/66 主分类号 H01L29/06
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