发明名称 |
Reactant gas ejector head and thin-film vapor deposition apparatus |
摘要 |
A reactant gas ejector head in a thin-film vapor deposition apparatus includes at least two reactant gas inlet passages for introducing reactant gases, a gas mixing chamber for mixing reactant gases introduced from the reactant gas inlet passages, and a nozzle disposed downstream of the gas mixing chamber for rectifying the mixed gases from the gas mixing chamber into a uniform flow and applying the uniform flow to a substrate.
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申请公布号 |
US5728223(A) |
申请公布日期 |
1998.03.17 |
申请号 |
US19960662763 |
申请日期 |
1996.06.10 |
申请人 |
EBARA CORPORATION |
发明人 |
MURAKAMI, TAKESHI;TAKEUCHI, NORIYUKI;SHINOZAKI, HIROYUKI;TSUKAMOTO, KIWAMU;FUKUNAGA, YUKIO;HONGO, AKIHISA |
分类号 |
C23C16/44;C23C16/448;C23C16/455;C30B25/14;H01L21/205;H01L21/31;(IPC1-7):C23C16/00 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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