A static induction transistor includes a substrate and a drift layer with different doping levels. At least two mesas are formed on the drift layer and a heavily doped region is positioned on a top surface of each of the mesas. A gate contact extends along a bottom of a recess between the mesas and along a side of each of the mesas forming the recess. The gate contact may also extend along a portion of the top surface of each of the mesas. In one embodiment of the invention, a notch is formed in the top surface of the mesas between the gate contact and the heavily doped region.
申请公布号
WO9810468(A1)
申请公布日期
1998.03.12
申请号
WO1997US04381
申请日期
1997.03.20
申请人
NORTHROP GRUMMAN CORPORATION
发明人
SIERGIEJ, RICHARD, R.;AGARWAL, ANANT, K.;CLARKE, ROWLAND, C.;BRANDT, CHARLES, D.