FILM-FORMING COMPOSITION SUITABLE FOR USE AS A MONOCOAT

摘要

A film-forming composition is provided comprising: (i) pigment; (ii) an aminoplast cross-linking agent containing methylol and/or methylol ether groups; and (iii) a polymer or oligomer selected from the group consisting of (a) an acrylic polymer or oligomer containing a plurality of groups of structure (I), wherein R1 is hydrogen or methyl and R2 is a divalent group; (b) a polyester polymer or oligomer containing a plurality of terminal carbamate groups of structure (II); and (c) mixtures thereof. The film-forming composition is suitable for application over a substrate as a monocoat which exhibits a high level of acid etch resistance.