发明名称 Semiconductor sensor array for chemical or medical applications
摘要 Semiconductor sensor array, especially for chemical analysis, process control and for medical applications, has interdigital micro-electrodes (2) in the form of ion implanted layers within a semiconductor substrate (1) or within a dielectric insulator layer or layer structure on the semiconductor substrate. When the implanted layers are within the substrate, they comprise different dopant concentration regions in the form of conductive pn-junctions within a 10 mu m to 5 mm (preferably 200 mu m to 1 mm) thick Si or Ge substrate and, when they are within a dielectric insulator layer, the layer preferably contains SiO2, Al2O3, Si3N4 and/or Ta2O5 and is 5 nm to 1 mu m (preferably 20-500 nm) thick. Also claimed is a process for producing the above sensor array by ion implantation.
申请公布号 DE19636461(A1) 申请公布日期 1998.03.12
申请号 DE19961036461 申请日期 1996.09.07
申请人 FORSCHUNGSZENTRUM JUELICH GMBH, 52428 JUELICH, DE 发明人 SCHOENING, MICHAEL, DR., 52428 JUELICH, DE;HORSTMANN, MANFRED, 52428 JUELICH, DE;KORDOS, PETER, PROF. DR., 52428 JUELICH, DE;LUETH, HANS, PROF. DR., 52076 AACHEN, DE
分类号 G01N27/403;(IPC1-7):G01N27/12;G01N27/27 主分类号 G01N27/403
代理机构 代理人
主权项
地址