发明名称 TRANSPARENT SUBSTRATE WITH THIN FILM AND METHOD FOR MANUFACTURING TRANSPARENT SUBSTRATE WITH CIRCUIT PATTERN WHEREIN SUCH TRANSPARENT SUBSTRATE WITH THIN FILM IS USED
摘要 <p>Disclosed is a method for producing a transparent substrate having a thin tin oxide film which can be easily patterned since ablation occurs therein even by irradiation of a low-energy laser light. Also disclosed is a method for manufacturing a transparent substrate with a circuit pattern wherein a transparent substrate with a thin film, namely a transparent substrate provided with a transparent conductive film having a carrier concentration of not less than 5 × 10<SUP>19</SUP>/cm<SUP>3</SUP>, is irradiated with a laser light having a wavelength of 1064 nm, so that a circuit pattern is formed on the transparent substrate.</p>
申请公布号 WO2007049653(A1) 申请公布日期 2007.05.03
申请号 WO2006JP321294 申请日期 2006.10.25
申请人 ASAHI GLASS CO., LTD.;SATOH, RYOHEI;NAKAGAWA, KOJI;MORINAGA, EIJI;USUI, REO;ISONO, TAKAMITSU;TANAKA, KENJI;TAKAKI, SATORU;EBATA, KENICHI;SAKAMOTO, HIROSHI 发明人 SATOH, RYOHEI;NAKAGAWA, KOJI;MORINAGA, EIJI;USUI, REO;ISONO, TAKAMITSU;TANAKA, KENJI;TAKAKI, SATORU;EBATA, KENICHI;SAKAMOTO, HIROSHI
分类号 H01B5/14;H01B13/00;H01J11/10;H01J11/22 主分类号 H01B5/14
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