| 摘要 |
A method is provided in which after completion of a finishing operation to define its shape, the surface of the magnetic transducer or magnetic recording media substrate is chemically cleaned to remove unwanted materials and other contaminants. In the second step, the substrate is inserted into a vacuum chamber (1), and the air in said chamber is evacuated. In the third step, the substrate surface is sputter-etched with energetic ions to assist in the removal of residual contaminants, i.e. hydrocarbons and surface oxides, and to activate the surface. Following the completion of the sputter-etch, a Si-DLC layer is deposited by ion beam deposition. Once the chosen thickness of the Si-DLC layer has been achieved, the deposition process on the substrates is terminated, the vacuum chamber (1) pressure is increased to atmospheric pressure, and the Si-DLC-coated substrates are removed from the vacuum chamber.
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