| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for formation of a reticle mask which eliminates the worry about the occurrence of defect by a misalignment. SOLUTION: This method forms the reticle mask by forming the reduced pattern reticle mask by using an original shape reticle mask having a reticle pattern arranged with a quadrilateral region and scribing line regions as a reduction element. In this method, the original shape reticle mask having the reticle pattern 27 provided with the scribing line regions 16a, b on the two sides of the quadrilateral circuit region 14 and provided with the dummy scribing line regions 16c, d on at least the remaining one side is used as the reduction element and any of the scribing line regions 16a, b on the two side and the dummy scribing line regions 16c, d are aligned, by which the plural circuit pattern regions of the reduced pattern reticle mask are formed. |
