发明名称 METHOD FOR VAPOR-DEPOSITING ANTIREFLECTION COATING ON OPTICAL SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a method for vapor-depositing antireflection coating on the surface of an optical substrate such as the glass of plastic glasses above or below an exchangeable vapor depositing source in an exhaustible vacuum vessel by which the difficult points that a vapor depositing material decomposes, suboxides are formed, and the change of the refractive index caused thereby is given are eliminated by heating a vapor depositing source as an electron beam vapor depositing apparatus or a thermal vapor depositing apparatus by resistance heating many times. SOLUTION: For generating antireflection coating per time of a vapor depositing stage, the face opposite to a vapor depositing soruce in a substrate 10 fitted to a supporting means 21 is first vapor-deposited, next, without stopping the operation of the vapor depositing source, the supporting means 21 is rapidly inverted, i.e., turned over together with the substrate 10, the face opposite to the vapor depositing source in the substrate 10 is similarly vapor-deposited, and after that, till a new vapor depositing stage, the vapor depositing soruce is periodically substituted for applying another antireflection coating to the surface of the substrate.
申请公布号 JPH1068065(A) 申请公布日期 1998.03.10
申请号 JP19970117150 申请日期 1997.05.07
申请人 SATIS VACUUM IND VERTRIEBS AG 发明人 SUTER RUDOLF
分类号 G02B1/11;C23C14/24;C23C14/50 主分类号 G02B1/11
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