| 摘要 |
PROBLEM TO BE SOLVED: To increase the throughput of an exposure device, by a method wherein, when a substrate stage is scanning in the horizontal direction, the receiving part of the substrate stage and the substrate holding part of a shifting arm are intersected with each other with slipped levels in the vertical direction. SOLUTION: A new reticle 1 mounted on a reticle hand 34 is sucked and held by a suction holding part 41. Next, the negative pressure of the suction holding part 41 is relived to lower the reticle hand 34 for delivering the reticle 31 to the receiving part 42 on a reticle stage 1 to be sucked at the receiving part 42 by the negative pressure further to be held on the reticle stage 1. In such a constitution, a notch 43 is provided on the reticle stage 1 so that even if the reticle stage 1 in the delivery finished state of the reticle 31 is shifted in the Y direction, the receiving part 42 of the reticle stage 1 and the suction holding part 41 may not interfere with each other, thereby enabling the reticle 31 to be scanned immediately after the reticle 31 is received on the reticle stage 1. |
