发明名称 SEMICONDUCTOR MEMORY
摘要 PROBLEM TO BE SOLVED: To protect a cell data by providing a first well region connect with a ground voltage on a semiconductor substrate, providing a second well region in the first well region, and then forming a first impurity region connected with an I/O pad and a second impurity region connected with the ground voltage in that region. SOLUTION: Impurity regions 306-308 are applied with an identical voltage. More specifically, the impurity regions 306-308 are connected with a ground voltage VSS in a structure where an n-well 303 is used in a grounded p-type substrate 301 and connected with a power supply voltage VCC in a structure where a p-well 303 is used in an n-type substrate 301. When undershoot takes place in a signal flowing in through an I/O pad 101 and the diode connection between an n<+> region 305 and a p well region 304 is biased forward, multiple electrons are injected into the p well 304. When the ground voltage VSS is applied to the n-well 303, the majority of injected electrons are passed directly to the ground from the p well 304.
申请公布号 JPH1070255(A) 申请公布日期 1998.03.10
申请号 JP19970194465 申请日期 1997.07.18
申请人 SAMSUNG ELECTRON CO LTD 发明人 RI JUTETSU;KIN KYOKI
分类号 G11C11/36;G11C11/407;H01L21/8242;H01L27/02;H01L27/10;H01L27/108 主分类号 G11C11/36
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