WAFER TREATMENT EQUIPMENT,申请号JP19970116143-传众专利搜索

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发明名称	WAFER TREATMENT EQUIPMENT
摘要
申请公布号	JPH1070084(A)	申请公布日期	1998.03.10
申请号	JP19970116143	申请日期	1997.04.18
申请人	YAMAGATA SHINETSU SEKIEI:KK;SHINETSU QUARTZ PROD CO LTD;SUZUKI SHIGEHARU	发明人	ISE YOSHIAKI;TAKAHASHI SHIYOUJI;SUZUKI SHIGEHARU
分类号	H01L21/22;H01L21/205;H01L21/263;H01L21/31;H01L21/324;(IPC1-7):H01L21/22	主分类号	H01L21/22
代理机构		代理人
主权项
地址

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