发明名称 SEPARATION METHOD FOR STAMP AND IMPRINTED SUBSTRATE LITHOGRAPHY PROCESS
摘要 <p>A method for separating a stamp from an imprinted substrate in an imprint lithography process is provided to shorten an interval of separation time by sequentially separating one and the other sides of one of mutually compressed substrates or clamps while gradually reducing a separation area. An imprint process is completed on a loaded substrate(110). One of a substrate or stamp(150) is separated, gradually isolated from its one side to the other side. The adsorption height is different in every adsorption location of the substrate or the stamp by individual adsorption and driving. The adsorption takes place in an adsorption location of the one side and adsorption and pressurization take place simultaneously in the rest of the adsorption location so that the one side of the substrate or stamp is separated primarily.</p>
申请公布号 KR100814264(B1) 申请公布日期 2008.03.18
申请号 KR20070048512 申请日期 2007.05.18
申请人 AVACO CO., LTD. 发明人 YANG, HEE CHUL;KIM, JONG SOO;JUNG, DAE YOON;KIM, BONG CHEOL
分类号 H01L21/027;G03F7/00 主分类号 H01L21/027
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