发明名称 DEFECT INSPECTION DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To quickly and highly accurately inspect the defect of a pattern formed on a specimen. SOLUTION: Electrons radially emitted from an electronic gun 12 are converged into a beam parallel to the optical axis AX by a condenser lens 14, the beam passes through a hole 16A, falls on a mask 16, and a plurality of multi-beams MB are formed. The multi-beams MB are reduced down to a quarter thereof with electromagnetic lenses 24, 26 while they are deflected with deflectors 18, 20, and made to impinge on a specimen 32. When the multi- beams MB passes through the electromagnetic lenses 24, 26, high energy is given and influence of color aberration and diffraction aberration are lessened because acceleration potential is applied to metal cylinder members 28, 30 or limited opening members 29, 31, so that the beams can be converged. Secondary electrons emitted from the specimen 32 are detected by detectors 38A, 38B, 38C through a multi-lens 34 and a multi-opening plate 36, so that the defect of a pattern on the specimen 32 is inspected.</p>
申请公布号 JPH1062503(A) 申请公布日期 1998.03.06
申请号 JP19960231522 申请日期 1996.08.13
申请人 NIKON CORP 发明人 NAKASUJI MAMORU
分类号 G01N23/225;G01R31/302;H01J37/28;H01L21/66;(IPC1-7):G01R31/302 主分类号 G01N23/225
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