| 发明名称 |
NON-CORROSIVE CLEANING COMPOSITION FOR REMOVING PLASMA ETCHING RESIDUES |
| 摘要 |
A non-corrosive cleaning composition for removing plasma etching residues comprising water, at least one quaternary ammonium hydroxide, and at least one corrosion inhibitor selected from (i) quaternary ammonium silicates and (ii) catechol nucleus-containing oligomers having a molecular weight in the range of about 220 to about 5,000.
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| 申请公布号 |
CA2214639(A1) |
申请公布日期 |
1998.03.06 |
| 申请号 |
CA19972214639 |
申请日期 |
1997.09.04 |
| 申请人 |
OLIN MICROELECTRONIC CHEMICALS, INC. |
发明人 |
HONDA, KENJI;MAW, TAISHIH |
| 分类号 |
G03F7/32;C23G1/22;G03F7/40;G03F7/42;H01L21/02;H01L21/306;H01L21/3213;(IPC1-7):C11D7/32;H01L21/77 |
主分类号 |
G03F7/32 |
| 代理机构 |
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