发明名称 |
ERROR DETECTION AND CORRECTION DEVICE FOR POSITION OF WAFER AND ITS METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide the error detection and correction device for the position of a wafer on a blade of a wafer carrying robot. SOLUTION: This device is a sensor placed in the vicinity of each entrance of a processing chamber to monitor the position of a wafer on a blade thereby deciding the position error of a wafer 10. This device incorporates a transparent cover 34 on a surface of a wafer processing chamber and a photosensor 60 placed on the face of the transparent cover. Furthermore, the sensor 60 directs a light through a slot 26 of the blade to sense and correct the positional error of the wafer toward a reflector 62. The position of the wafer on the blade is measured based on a distance between an end of a hole of the blade and an end of the wafer 10 and whether or not the wafer is placed correctly on the blade is decided. |
申请公布号 |
JPH1064971(A) |
申请公布日期 |
1998.03.06 |
申请号 |
JP19970186727 |
申请日期 |
1997.07.11 |
申请人 |
APPLIED MATERIALS INC |
发明人 |
FREERKS FREDERICK W;BERKEN LLOYD M;CRITHFIELD UENIA M;SCHOTT DAVID;RICE MICHAEL;HOLTZMAN MICHAEL;REAMS WILLIAM;GILJUM RICHARD;LANCE RAIN;BOOTH JOHN S |
分类号 |
H01L21/677;H01L21/00;H01L21/68;(IPC1-7):H01L21/68 |
主分类号 |
H01L21/677 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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