发明名称 ERROR DETECTION AND CORRECTION DEVICE FOR POSITION OF WAFER AND ITS METHOD
摘要 PROBLEM TO BE SOLVED: To provide the error detection and correction device for the position of a wafer on a blade of a wafer carrying robot. SOLUTION: This device is a sensor placed in the vicinity of each entrance of a processing chamber to monitor the position of a wafer on a blade thereby deciding the position error of a wafer 10. This device incorporates a transparent cover 34 on a surface of a wafer processing chamber and a photosensor 60 placed on the face of the transparent cover. Furthermore, the sensor 60 directs a light through a slot 26 of the blade to sense and correct the positional error of the wafer toward a reflector 62. The position of the wafer on the blade is measured based on a distance between an end of a hole of the blade and an end of the wafer 10 and whether or not the wafer is placed correctly on the blade is decided.
申请公布号 JPH1064971(A) 申请公布日期 1998.03.06
申请号 JP19970186727 申请日期 1997.07.11
申请人 APPLIED MATERIALS INC 发明人 FREERKS FREDERICK W;BERKEN LLOYD M;CRITHFIELD UENIA M;SCHOTT DAVID;RICE MICHAEL;HOLTZMAN MICHAEL;REAMS WILLIAM;GILJUM RICHARD;LANCE RAIN;BOOTH JOHN S
分类号 H01L21/677;H01L21/00;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/677
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