| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photosensitive resin compsn. having high transparency to light of short wavelength for exposure and satisfying photodegradability and high efficiency of acid generation by incorporating a specified N- hydroxymaleimide type sulfonate photo-acid generating agent and a resin having substituents increasing solubility to an alkali developer under an acid. SOLUTION: This photosensitive resin compsn. contains an N- hydroxymaleimide type sulfonate photo-acid generating agent represented by the formula and a resin having substituents increasing solubility to an alkali developer under an acid. In the formula, each of R1 and R2 is H, 1-6C alkyl or <=6C cycloalkyl, R1 and R2 may form a ring by bonding through an alkylene chain and R3 is alkyl, perfluoroalkyl, cycloalkyl or a substitution product of camphor. Since this compsn. has high transparency to light of 170-220nm wavelength and has high efficiency of acid generation at the time of exposure with light of 170-220nm wavelength, it is fit for exposure with light of 170-220nm wavelength. |
