发明名称 PHOTOSENSITIVE MATERIAL PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive material processing device which is capable of maintaining the coating amt. of a developer constant and improving a maintenance characteristic. SOLUTION: A developer applying mechanism 43 has a coating applying roller 125 which is formed with plural grooves by metallic wires on its surface and applies the developer on a planographic printing plate M by rotating in contact with the planographic printing plate M and a back up roller 128 of which the surface is composed of closed cell sponge and which comes into contact with the coating roller 125. The coating roller 125 and the back up roller 128 rotate at circumferential speeds different from each other.
申请公布号 JPH1062950(A) 申请公布日期 1998.03.06
申请号 JP19960233656 申请日期 1996.08.14
申请人 MITSUBISHI PAPER MILLS LTD;DAINIPPON SCREEN MFG CO LTD 发明人 KUNIHIRO AKIRA;KURIO SADAO;TANABE KUNIHIRO;MIYASAKA EIJI;KAWAGUCHI YASUHIRO
分类号 G03F7/30;G03D5/06;G03D9/00;G03D13/00;(IPC1-7):G03D5/06 主分类号 G03F7/30
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