发明名称 PELLICLE FOR LITHOGRAPHY
摘要 PROBLEM TO BE SOLVED: To prevent production of dust and to avoid such problems that a pellicle film expands and break even when environmental conditions such as external air or temp. change by providing an adhesive layer with an aeration filter to adhere and fix a pellicle to an exposure master plate. SOLUTION: This pellicle consists of a pellicle film 1, frame 2, and adhesive layer 6 in such a manner that the pellicle film 1 is adhered to the upper face of the frame 2 with an adhesive 5 or a good solvent of the pellicle film 1, that the adhesive layer 6 is formed on the lower face of the frame 2 and that the frame is adhered and fixed to an exposure master plate 3. The adhesion layer 6 is provided with an aeration filter 9 so that air can be passed between the inside and outside of the pellicle. Thereby, a sealed state in the frame 2 can be avoided and such a problem that the pellicle film 1 expands or sinks is avoided even when environmental conditions, especially the atmospheric pressure or temp. change.
申请公布号 JPH1062966(A) 申请公布日期 1998.03.06
申请号 JP19960231330 申请日期 1996.08.13
申请人 SHIN ETSU CHEM CO LTD 发明人 KASHIDA SHU
分类号 G03F1/64;H01L21/027 主分类号 G03F1/64
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